School of Technology and Computer Science Seminars
Phase Shifting Masks for Microlithography
by Mr. Tapan Shah (School of Technology and Computer Science)
Friday, May 18, 2012
from
to
(Asia/Kolkata)
at Colaba Campus ( A-212 (STCS Seminar Room) )
at Colaba Campus ( A-212 (STCS Seminar Room) )
Description |
I will introduce the problem of mask design in a lithographic process from a systems perspective and show how it can be reduced to a non-linear optimization problem. I will also show the benefit of phase shift mask over the binary mask with some examples. Lastly, I will show how a complex mask can be replaced by successive real valued masks (double exposure theorem). |